Intel Asml To Usher In A New Age Of Semiconductor Lithography Technology With The Twinscan Exe 5200
Intel and ASML heighten their union to push high numerical aperture technology into manufacturing over the next several years Intel disclosed last July during the company’s Accelerated event that it intends to deliver the first High-NA technology to promote its plans of transistor innovations. Intel has continued to show interest in High-NA technology when the company was the first to purchase the previous TWINSCAN EXE:5000 system in 2018. With the new purchase from partnering company ASML, Intel continues the drive forth the company’s High-NA EUV manufacturing commencing in 2025....